【摘要】 纳米晶材料与常规晶体材料相比有许多优良的性能 ,已受到广泛关注。本文采用电沉积方法获得了Ni W纳米晶合金镀层。研究了镀液中钨酸钠含量、温度、pH值及电流密度对沉积速度的影响。测定了镀层的显微硬度 ,并用X -射线衍射仪对其微观结构进行了观察。结果表明 ,影响沉积速度最大的因素为pH值 ,其次是电流密度 ;镀层显微硬度最高可达 6 70 .3HV。通过正交试验得出适宜工艺条件范围为 :Na2 WO4·2H2 O 1 0～ 30g/L ,电流密度 1 0～1 5A/dm2 ,温度 6 0～ 70℃ ,pH值 6～ 7。更多还原

【Abstract】 Nanocrystalline materials are attracting more and more attention for their excellent properties compared with common crystalline materials. Nanocrystalline Ni-W alloy coatings were obtained by electrodeposition in this paper. The effect of sodium tungstate content in the solution, temperature, pH value and current density on the deposition rate was studied. The microhardness of the coatings was tested, and the microstructure of the coatings was studied with an X-ray diffraction instrument. The results show that of all the factors affecting the deposition rate, pH value is the strongest, and followed by current density. The microhardness of the coatings can reach 670.3 HV. Suitable process condition ranges were optimized by orthogonal test as below:Na₂WO₄·2H₂O content 10～30 g/L, current density 10～15 A/dm², temperature 60～70 ℃,pH value 6～7。更多还原