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用于制备纳米多层膜的金属掩膜法的研究
Study on metallic mask method for preparing nano-multilayers
【摘要】 简介了现有金属腌膜法制备纳米多层膜的过程,指出采用定位图形套准模板存在的弊端,研制出采用定位框固定基片、套准模板的制备新方法及装置。试验表明,采用该方法可显著提高制备纳米多层膜的完好率及套准精度。
【Abstract】 The existing process of preparing nano - multileyers using metallic mask method is briefly introduced, the short-comings of aligning patterns using located figures were pointed out. A new preparing way and divice was given out. The testingresults show that the intact rate of nano - multilayers and the aligning accuracy were improved obviously by adopting the way.
【基金】 天津市高等学校科技发展基金(01-20216)
- 【文献出处】 兵器材料科学与工程 ,Ordnance Material Science and Engineering , 编辑部邮箱 ,2004年03期
- 【分类号】TB383
- 【被引频次】2
- 【下载频次】167