【摘要】 设计了"H"型六维x y工件台,利用磁悬浮技术将工件台悬浮在x、y导轨上,消除了导轨的摩擦和磨损;直线电机无接触驱动实现了工件台的粗定位;控制不同磁悬浮电磁铁的电流大小,可以实现工件台的微定位以及逐场调平调焦。计算了工件台由于重力弯曲、热膨胀等原因引起结构变形而带来的精度误差,理论上分析证明工件台在x、y方向能满足0.02μm的定位精度要求以及达到0.1μm调焦精度和3.0μrad调平精度的要求。将应用于特征尺寸0.18μm线宽激光光刻机上。更多还原

【Abstract】 An "H"type xy stage that can locate a wafer in six degrees of freedom is designed. The stage is suspended on the x&y rails by applying magnetic levitation(Maglev.)technology.There are no friction and wearing to the rails. The stage is driven speedily and positioned coarsely by linear motors with noncontact driving,When controlling and adjusting the current of electromagnetic coils,fine positioning,fieldbyfield leveling and focusing to the stage can be implemented. Accuracy errors on stage caused by weight bending and thermal expansion of the construction are calculated.It is analyzed and proved that the stage can meet 0.02μm positioning accuracy in x?y axises,0.1 μm focusing accuracy and 3.0μrad leveling accuracy.This stage will be applied in the new generation of laser photolithography equipment with critical dimension 0.18μm.更多还原