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微波等离子体化学气相沉积法低温制备直纳米碳管膜
Synthesis of Straight Carbon Nanotube Films by Microwave Plasma Chemical Vapor Deposition at Low Temperature
【Abstract】 Among the three main methods for the s ynthesis of carbon nanotubes(CNTs ),chemical vapor deposition(CVD)has received a great deal of attentio n since CNTs can be synthesized at sig nificantly low temperature.Plasma chemical vapor deposition me thods can synthesize CNTs at lower te mperature than thermal CVD.But in th e usual catalytic growth of CNTs by CVD,CNTs are often tangled together and have some defects.These will limit t he property research and potential applications.How to synthesize the str aight CNTs at low temperature become s a challenging issue.In this letter,s traight carbon nanotube(CNT)films were achieved by microwave pla sma chemical vapor deposition(MWPCVD)catalyzed by round Fe-Co-Ni alloy particles on Ni substrate at 610℃.It wa s found that,in our experimental condition,the uniform growth rate along the circumference of round alloy particles plays a very important role in the gro wth of straight CNT films.And because the substrate is conducting,the straight CNT films grown at low temperature ma y have the benefit for property research and offer the possibility to use t hem in the future applications.
【Key words】 straight carbon nanotube films Fe-Co-Ni alloy microwave plasma chemical vapor deposition low temperature Ni substrate;
- 【文献出处】 无机化学学报 ,Chinese Journal of Inorganic Chemistry , 编辑部邮箱 ,2003年03期
- 【分类号】TB383
- 【被引频次】25
- 【下载频次】415