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微波等离子体化学气相沉积法低温制备直纳米碳管膜

Synthesis of Straight Carbon Nanotube Films by Microwave Plasma Chemical Vapor Deposition at Low Temperature

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【作者】 王升高汪建华张保华王传新马志斌满卫东

【Author】 WANG Sheng-Gao *,1 WANG Jian-Hua 1 ZHANG Bao-Hua 1 WANG Chuan-Xin 2 MA Zhi-Bin 1 MAN Wei-Dong 2 ( 1 Province Key Laboratory of Plasma Chemistry and Advanced Materials(The Department of Material Science and Engineering),Wuhan Institute of Chemical Technology,Wuhan430073)( 2 Institute of Plasma Physics,The Chi nese Academy of Science,Hefei220031)

【机构】 武汉化工学院等离子体化学与新材料省重点实验室(材料科学与工程系)中国科学院等离子体物理研究所中国科学院等离子体物理研究所 武汉430073武汉430073合肥220031合肥220031

【Abstract】 Among the three main methods for the s ynthesis of carbon nanotubes(CNTs ),chemical vapor deposition(CVD)has received a great deal of attentio n since CNTs can be synthesized at sig nificantly low temperature.Plasma chemical vapor deposition me thods can synthesize CNTs at lower te mperature than thermal CVD.But in th e usual catalytic growth of CNTs by CVD,CNTs are often tangled together and have some defects.These will limit t he property research and potential applications.How to synthesize the str aight CNTs at low temperature become s a challenging issue.In this letter,s traight carbon nanotube(CNT)films were achieved by microwave pla sma chemical vapor deposition(MWPCVD)catalyzed by round Fe-Co-Ni alloy particles on Ni substrate at 610℃.It wa s found that,in our experimental condition,the uniform growth rate along the circumference of round alloy particles plays a very important role in the gro wth of straight CNT films.And because the substrate is conducting,the straight CNT films grown at low temperature ma y have the benefit for property research and offer the possibility to use t hem in the future applications.

【基金】 湖北省教育厅重点资助项目(No.2002A20008)。
  • 【文献出处】 无机化学学报 ,Chinese Journal of Inorganic Chemistry , 编辑部邮箱 ,2003年03期
  • 【分类号】TB383
  • 【被引频次】25
  • 【下载频次】415
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