【摘要】 纳米光刻技术在微电子制作中起着关键作用 ,而电子束光刻在纳米光刻技术制作中是最好的方法之一。我们使用VB5电子束曝光系统 ,经过工艺研究 ,现已研究出最细分辨率剥离金属条为 17nm ,最小剥离电极间距为 10nm ,最细T型栅为 10 0nm。更多还原

【Abstract】 Nano lithography technology plays a very important role in the field of nano electronic manufacturing, while e beam lithography is one of the best ways to produce nano features. Using VB5 e beam exposure system, gold lift off fine lines of 17nm, fine spaces between metal lift off electrodes of 10nm, and fine T gates of about 100nm have been made.更多还原