节点文献
以非晶碳作硅基红外增透膜的实验研究
Experimental Study on Infrared Film of Antireflective Amorphous carbon on Silicon
【摘要】 在室温下 ,用激光烧蚀石墨靶方法在单晶硅衬底表面沉积了不同厚度的非晶碳膜。对膜进行了表面形貌观察 ,测试并分析了膜的拉曼散射光谱和傅里叶变换红外光谱。发现膜含微晶石墨杂质较少 ,观察到 12 0 0cm-1附近的非晶金刚石拉曼峰 ,膜层在红外的光透过率高 ,在硅衬底上适宜于制作波长短于 8μm的红外增透膜。
【Abstract】 Several amorphic carbon films with different thickness were deposited on single crystal silicon by means of pulse laser ablating graphet target at room temprature. Morphology was observed with scanning electron microscope (SEM). Raman scattering spectroscopy and Fourier transform infrared spectroscopy (FTIR) were analysised. It is found that these films had little of graphet micro crystaline in their matrix. A Raman peak for amorphic diamond was found around 1200 cm -1 . These films were transparent in infrared and suit for antireflective film deposited on silicon in the range of wavelength short than 8 μm.
【Key words】 laser ablating; amorphic carbon film; infrared transmittance increasing;
- 【文献出处】 光学学报 ,Acta Optica Sinica , 编辑部邮箱 ,2002年11期
- 【分类号】O484.41
- 【被引频次】2
- 【下载频次】158