【摘要】 用轧制及再结晶方法制备了高度立方织构的金属Ni(镍 )基带 .采用电子束蒸发的方法在几个厘米长的Ni基带表面上生长YSZ(钇稳定二氧化锆 )阻挡层 .X射线衍射分析表明 ,YSZ层具有纯c轴取向和良好的平面内取向及立方织构 .扫描电镜观察表明 ,YSZ阻挡层连续致密无裂纹 .更多还原

【Abstract】 The {100}\ cube textured metal Ni was obtained by cold rolling process followed by a recrystallization heat treatment. YSZ oxide buffer layer on textured Ni tape of a few centimeter long was deposited by electron beam evaporation. X ray diffraction was used to measure c axis , in plane orientation and pole figure. It showed that YSZ film was pure c axis alignment, a good in plane orientation and cubic texture. The result of SEM examination of the YSZ buffer layer microstructure was presented. No microcrack was observed.更多还原