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基片表面的磁场对磁控溅射法制备Fe-N薄膜特性的影响

Effect of Perpendicular Magnetic Field on Properties of Fe-N Films Grown by Reactive Magnetron Sputtering

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【作者】 朱炎; 狄国庆; 陈亚杰; 赵登涛; 杨海峰;

【Author】 Zhu Yan,Di Guoqing,Chen Yajie,Zhao Dengtao,Yang Haifeng (Physics Department of Suzhou University,Suzhou,215006)

【机构】 苏州大学物理系!苏州215006;

【摘要】 利用反应磁控溅射方法制备了Fe N薄膜。发现未退火的薄膜基本处于非晶或微晶状态 ,退火或在沉积时对基片施加一磁场 ,可使晶粒变大 ,并出现对应内部存在应力的γ′ Fe4N的 (110 )晶面的择优取向。特别是外加的磁场使得Fe N薄膜具有明显改善的磁性能。作者利用磁场中带电粒子受约运动的观点解释了这一现象

【Abstract】 Fe N thin films,grown by RF magnetron sputtering in an Ar/N 2 gas mixture,was studied.The results show that before annealing,the film has amorphous or micro crystalline structures.If the film was annealed in vaccum at 140 ℃ 100 min or if a magnetic field perpendicular to the surfaces of the film is applied,the grain sizes can increase and a preferential orientation of the grains,(110)direction of γ′ Fe 4N,can be observed.In addition,the magnetic field improves the magnetic properties of the films;and its possible mechanism responsible was tentatively discussed.

【关键词】 FeN薄膜; 磁场; 磁性能; 晶粒;
【Key words】 Fe N films; Magnetic field; Magnetic properties; Crystalline grain;
  • 【文献出处】 真空科学与技术 , 编辑部邮箱 ,2001年04期
  • 【分类号】TN305
  • 【被引频次】2
  • 【下载频次】93
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