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光诱导聚合蒙脱土插层纳米复合材料的研究
A STUDY ON THE PREPARATION OF POLYMER/MONTMORILLONITE NANO-COMPOSITE MATERIALS BY PHOTO-POLYMERIZATION
【摘要】 用两种光聚合法研究了蒙脱土插层复合材料的制备 .用小角X光衍射技术对产物内蒙脱土的结构进行表征 ,结果表明 ,蒙脱土经改性后能很好地使聚合单体及预聚物插入黏土层内并在光照下“就地”聚合生成光聚合复合材料 .对光聚合法制备蒙脱土纳米复合材料的优缺点进行了初步讨论
【Abstract】 The preparation of polymer/montmorillonite intercalation composite materials has been studied by applying two kinds of photo polymerization reaction (photo acid generation and photo radical generation)in this work.Small angle X ray diffraction technique was used for the structural characterization of montmorillonite contained in the products.Results indicated that after surface modification of montmorillonite the monomer(methyl methacrylate,MMA)and the prepolymer (m cresol/HMMM) were able to intercalate into the layers of the clay and to polymerize "in situ" to obtain photo polymerized composite materials.The advantages and the demerits of the method of photo polymerization for preparation of these composite materials have been discussed preliminaryly.
【Key words】 photo polymerization; montmorillonite; intercalation; small angle X ray diffraction technique; nano composite materials;
- 【文献出处】 感光科学与光化学 ,Photographic Science and Photochemistry , 编辑部邮箱 ,2001年04期
- 【分类号】TB33
- 【被引频次】12
- 【下载频次】105