【摘要】 用射频 /直流磁控溅射法制备了NiOx/Ni81Fe19和Co/AlOx/Co磁性薄膜。利用X射线光电子能谱研究了NiOx 对Ni81Fe19耦合交换场Hex与NiOx 化学状态的关系以及Co/AlOx/Co磁性薄膜中AlOx 对Co膜的覆盖状况。结果表明 :Hex的大小只与 +2价镍有关 ,单质镍和 +3价镍对Hex没什么作用 ;在Co/AlOx/Co磁性薄膜中 ,Al层将Co膜完全覆盖所需要的最小厚度为 2 .0nm ,用角分辨XPS测出的Al氧化厚度为 1 15nm更多还原

【Abstract】 NiO x /Ni 81 Fe 19 and Co/AlO x /Co magnetic multilayers were fabricated by reactive RF/DC magnetron sputtering on oxidized Si(100) substrates.The exchange biasing field H ex between NiO x and Ni 81 Fe 19 as a function of NiO x oxidation states was studied by X ray photoelectron spectroscopy.We also analyzed Al layers in magnetic multilayer films consisting of Co/AlO x /Co.Our finding is that H ex only depends on Ni 2+ but not on Ni 3+ and Ni.The bottom Co can be completely covered by depositing an Al layer thicker than 2.0 nm.The thickness of AlO x is 1 15 nm.更多还原