【摘要】 利用直流磁控溅射制得非晶态氮化碳膜，然后在高温下、常压Ｎ 气氛中进行热处理，利用ＤＴＡ，ＸＲＤ 和Ａｕｇｅｒ研究晶化前后氮化碳成分、结构以及键态的变化．实验结果表明：在１１８６ ℃附近出现了晶化现象，高温晶化处理可以促进无定形氮化碳向晶态转变，在ＸＲＤ图谱上出现αＣ３Ｎ４ 衍射峰．Ａｕｇｅｒ 实验结果表明膜中出现富Ｃ，Ｓｉ，Ｎ 的区域更多还原

【Abstract】 The amorphous carbon nitride films were prepared by dc magnetron sputtering first,and then were heat\|treated at high temperature.DTA,XRD,Auger spectroscopy were used to study the difference of composition,structure before and after heat\|treatment.The results showed that crystallization occurred at 1186℃.Heat\|treatment can induce the crystallization of carbon nitride and the diffraction peaks appeared in the XRD pattern.The results of Auger spectroscopy also showed that there existed SiCN\|riched area and the content of N decreased.更多还原