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金刚石薄膜场致发射的研究

Field Emission from the Diamond Film

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【作者】 唐敦乙林书铨张志明沈荷生李胜华

【Author】 TANG Dun yi 1, LIN Shu quan 1, ZHANG Zhi min 2, SHEN He sheng 2, LI Sheng hua 2 1. HDTV Inst., Shanghai Jiaotong Univ., Shanghai 200030, China; 2. Microelectronics Inst., Shanghai Jiaotong Univ., Shanghai 200030

【机构】 上海交通大学HDTV研究所!上海200030上海交通大学微电子研究所

【摘要】 给出了以硅片和钼片作基底,在不同掺杂状态下的几种金刚石薄膜的发射特性和两种金刚石薄膜的扫描电子显微镜照片及喇曼光谱.测试结果表明,掺杂后的金刚石薄膜的发射电流密度可增大一个数量级.

【Abstract】 The mechanisim of field emission was explained. Several cathodes of different type used in the field emission display were described. The features of the field emission display were depicted. The emission characteristic of several types of the diamond film, which is prepared at different dope condition and on substrate of silicon or molybdenum, was reported. The results show that the density of emission current from doped diamond film is increased by one order of magnitude.

  • 【文献出处】 上海交通大学学报 ,JOURNAL OF SHANGHAI JIAOTONG UNIVERSITY , 编辑部邮箱 ,2000年02期
  • 【分类号】TN304.1
  • 【被引频次】9
  • 【下载频次】98
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