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金刚石膜氧化行为的TGA分析
Thermogravimetric Analysis of the Oxidation of CVD Diamond Films Synthesized by DC Plasma Jet
【摘要】 采用热重分析法 (TGA)对直流等离子体喷射制备的金刚石膜在空气中的氧化行为进行了研究 ,结果表明 :直流等离子体喷射制备的金刚石膜氧化激活能为 2 2 0kJ/mol,与天然金刚石的氧化激活能相当。用扫描电子显微镜 (SEM )和Raman光谱对金刚石膜氧化前后的形貌和成分作了分析。结果表明 :金刚石膜在空气中氧化优先刻蚀晶界和孔隙 ,孔隙不断增加 ,晶界瓦解 ,金刚石膜成为一个个柱状单晶粉末 ;金刚石膜氧化前后未出现石墨或其它中间产物
【Abstract】 Oxidation of polycrystalline free standing diamond film in air at temperature up to 1073K was investigated by thermogravimetry. The oxidation rates were measured between 973K to 1123K, to determine an activation energy of 220kJ/mol, which is similar to nature diamond. The diamond films before and after oxidation were characterized by SEM. The oxidation proceeds by etching preferentially grain boundary into the films,creating a highly porous structure. In end diamond films become a lot of spire like monocrystalline structure. Graphitization was not detected in partially oxidized samples by Raman.
- 【文献出处】 金属热处理学报 ,Transactions of Metal Heat Treatment , 编辑部邮箱 ,2000年04期
- 【分类号】TB43
- 【被引频次】15
- 【下载频次】243