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用离子注入的方法实现InGaAs/InGaAsP激光器材料的量子阱混合
Quantum well intermixing of InGaAs/InGaAsP laser- structure using ion implantation
【摘要】 为了在光开关器件的局部区域实现量子阱混合,选用1~2MeV、1×1013~5×1013cm-2的P+离子注入到InGaAs/InGaAsP分别限制多量子阱(SCH-MQW)激光器结构,在700oC下快速热退火90s。发现光致发光谱的峰值位置发生蓝移9~89nm。蓝移的大小随着注入能量和剂量的增大而增大,并且能量比剂量对蓝移的影响更大。
【Abstract】 In this paper, a very successful technique that uses phosphorus ion implantation to enhance the interdiffusion of QW in InP based laser structure was described. Room- temperature photoluminescence (PL) spectra was obtained on the samples. PL emission peaks of the samples varies with dose and energy of implantation. PL spestra are blue- shifted in wavelength from 9nm to 89nm.
【关键词】 量子阱混合;
波长蓝移;
InGaAs/InGaAsP;
光致发光谱;
【Key words】 Quantum well intermixing; Blue- shift in wavelength; InGaAs/InGaAsP; PL spectra;
【Key words】 Quantum well intermixing; Blue- shift in wavelength; InGaAs/InGaAsP; PL spectra;
【基金】 国家自然科学基金;北京新星计划资助项目
- 【文献出处】 功能材料与器件学报 ,JOURNAL OF FUNCTIONAL MATERIALS AND DEVICES , 编辑部邮箱 ,2000年03期
- 【分类号】TN248
- 【下载频次】59