节点文献

新型超硬C-N薄膜材料

NEW SUPERHARD CARBON NITRIDE FILM MATERIAL

  • 推荐 CAJ下载
  • PDF下载
  • 不支持迅雷等下载工具,请取消加速工具后下载。

【作者】 张贵锋杨振江耿东生

【Author】 Zhang Guifeng, P O Box 72, Northwestern Polytechnical University, Xi′an 710072 Yang Zhenjiang, Geng Dongsheng

【机构】 西北工业大学

【摘要】 C-N薄膜是目前国际上刚刚兴起的一种新型超硬材料。理论上,它的体模量和硬度比金刚石还要高。在半导体和抗磨涂层等领域有着广阔的应用前景。文中介绍了新型C-N薄膜材料的发展概况、几种典型的制备方法、结构及性能特点,分析了C-N膜的发展方向及其应用前景。

【Abstract】 The existance of a stable phase of β-C 3N 4, similar to the structure of β-Si 3N 4 and with superior mechanical properties to those of diamond, has been predicted by theoretical calculation. In the last few years considerable efforts have been made in an attempt to grow carbon nitride thin films. However, only recently it has been reported that a thin film with a predominant β-C 3N 4 phase can be prepared by laser ablation of graphite in the presence of atomic nitrogen. The experimental sythesis of new type C-N materials offers exciting prospects for both basic research and engineering applications. In this article the historical development of C-N materials were reviewed. Various Preparation methods and microstructure of carbon nitride films wrer described. The properties and prospects for industrial applications were also discussed.

【关键词】 碳氮薄膜超硬材料
【Key words】 carbon nitride filmssuperhardness
【基金】 航空科学基金
  • 【文献出处】 兵器材料科学与工程 ,ORDNANCE MATERIAL SCIENCE AND ENGINEERING , 编辑部邮箱 ,1998年04期
  • 【分类号】TQ174.758.12
  • 【被引频次】2
  • 【下载频次】105
节点文献中: