【摘要】 发展了使用直流辉光放电等离子体辅助反应蒸发法在低温玻璃基片上制备ＩＴＯ膜的工艺，研究了主要的工艺参数，如Ｓｎ／Ｉｎ配比，氧分压，基片温度等对于膜的透光率和电阻的效应。更多还原

【Abstract】 A range of indium tin oxide (ITO) film were deposited on glass substrates at low temperature using DC glow discharge plasma enchanced reactive evaporating. The effects of the primary depositing parameters, such as Sn/In ratio, oxygen pressure, substrate temperature, on the film transmission and resistance were investigated.更多还原