节点文献
等离子体增强磁控溅射离子镀TiN涂层的研究
Study on TiN Coatings Deposited by Plasma Enhanced Magnetron Sputter Ion Plating
【摘要】 利用等离子体增强磁控溅射离子镀(PEMSIP)沉积TiN涂层,研究涂层的组织结构和性能。随着氮气分压增加涂层相组成朝着富氮相及其含量增加的方向发展。氮气分压对涂层硬度的影响是由膜层相组成变化引起的,由Ti2N和TiN两相组成的涂层比TIN单相涂层的硬度高。由Ti2N和TiN组成的刀具涂层使切削力下降。
【Abstract】 Abstract TiN coatings were deposited by Plasma Enhanced Magnetron Sputter ion Plating (PEMSIP).Microstructures and properties of TiN coatings have been studied. Variation of component phases trends towards the formation of nitrides rich in nitrogen and the increase of its content with the increase of N2 partial pressure. The effect of N, partial pressure on the microhardness is mainly caused by that the N2 partial pressure effects the component phase of the coatings,while the microhardness of the coatings consisted of Ti,N and TiN is harder than that of TiN only.Tool coatings consisted Ti2N and TiN make cutting force decrease.
- 【文献出处】 真空 ,VACUUM , 编辑部邮箱 ,1996年01期
- 【分类号】TG174.44
- 【被引频次】11
- 【下载频次】254