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监测CMOSIC关键失效的微电子测试结构
Microelectronic Test Structures for Appraising Key Failures in CMOS IC’s
【摘要】 介绍了CMOSIC的静电放电微电子测试结构,叙述了双极-MOS兼容的闭锁效应和闭锁滞后现象的微电子测试结构,并对测试结果进行了讨论。
【Abstract】 Electrostatic discharge test structures for CMOS IC’s are presented. Microelectronic test structures for latch-up effeet in bipolar-MOSFET merged devices and for latch-up hysteresis phenomenon are described. Finally,test results are discussed.
【关键词】 集成电路;
可靠性;
电路测试;
微电子;
失效;
闭锁;
【Key words】 IC; Microelectronic test structure; CMOS; Latch-up effect; Failure mechanism;
【Key words】 IC; Microelectronic test structure; CMOS; Latch-up effect; Failure mechanism;
- 【文献出处】 微电子学 ,MICROELECTRONICS , 编辑部邮箱 ,1996年01期
- 【分类号】TN406
- 【下载频次】51