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直流PCVD Ti(CXN1-X)硬质膜及其应用
The Deposition of DC-PCVD Ti(C_XN(1-X)) Coatings and its Application
【摘要】 对不同成分的PCVD-Ti(CXN1-X)膜的组织结构及性能进行了研究。结果表明,Ti(CN)膜的高硬度、高致密组织和膜表面因吸附氧而形成的与TiN不同的表面结构是Ti(CN)膜性能优于TiN膜的重要因素。在冷挤压模上应用结果也表明,用PCVD法制备的Ti(CN)膜和TiC膜的使用效果要比TiN膜好得多。
【Abstract】 Ti (CXN1-X) coatings with different C and N contents were prepared using DC discharge plasma chemical vapor deposition (DC-PCVD). These coatings were characterized and used in cold extrusion dies. The wear resistance of Ti(CN) coatings is much better than that of TiN coatings. The improvement of coating properties upon adding carbon to TiN could be attributed to the higher hardness,denser structure and different chemical state of oxygen adsorbed on the surface of the coatings.
【关键词】 等离子体化学气相沉积(PCVD);
Ti(CXN1-X)膜;
【Key words】 plasma chemical vapor depositiopn (PCVD); Ti(CXN1-X) coatings;
【Key words】 plasma chemical vapor depositiopn (PCVD); Ti(CXN1-X) coatings;
【基金】 国家八五科技攻关项目
- 【文献出处】 金属热处理 ,Heat Treatment of Metals , 编辑部邮箱 ,1996年07期
- 【分类号】TG156
- 【被引频次】3
- 【下载频次】39