节点文献
电子束曝光机扫描场非正交性畸变校正
CORRECTYION OF NON-ORTHOGONAL DISTORTION IN SCANNING FIELD OF ELECTRON BEAM LITHOGRAPHY MACHINE
【摘要】 本文介绍了我校研制的矢量扫描电子束曝光机中,扫描场非正交性畸变的校正情况,该机器的偏转系统为内透镜双磁偏转方式。
【Abstract】 The paper introduces a method of correction of non -orthogonal distortionin scanning field of a vactor scan electron-beam lithography machine which isdeveloped in our university. The deflecting system of the machine uses in -lens double magnetic deflection technique.
【关键词】 电子束曝光机;
偏转系统;
畸变校正;
【Key words】 electron-beani lithography; deflection system; distortion correction;
【Key words】 electron-beani lithography; deflection system; distortion correction;
- 【文献出处】 微细加工技术 ,MICROFABRICATION TECHNOLOGY , 编辑部邮箱 ,1995年02期
- 【分类号】TN305.7
- 【被引频次】1
- 【下载频次】44