【摘要】 本文介绍单靶直流磁控溅射三元复合（Ti,Al）N硬化膜的研制结果。制得的Ti_0.5Al_0.5N腹具有（111）面择优取向Bl NaCl立方结构,显微硬度达到2700kg/mm²,并具有良好的抗氧化性和抗酸腐蚀性。文中着重讨论了沉膜过强中氮分压、基片负偏压以及基片温度对薄膜显微硬度、形貌、晶粒尺寸和晶格常数的影响。更多还原

【Abstract】 Ternary （Ti. Al）N hard films have been deposited on the high speed steel substrates by DC mngaetron sputtering from a single Ti, Al target. The Ti_0·5 Al_0·5 N films, with a Bl NaCl structure and a （111） prefered orientation, were found to have a microhardness of 2700 kgf/mm², a good oxidation resistance and anti-acid corrosion. The influenceof Nitrogen partial pressure, substrate bias and temperature oa microhardness, microstructure, grain size and lattice constant of the films, was discussed in the paper.更多还原