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铁钝化膜厚度的电化学和光电化学测量

Electrochemical and Photoelectrochemical Measures of the Thickness of Iron Passive Film

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【作者】 张国栋郭万华姚文锐

【Author】 Zhang Guodong Guo Wanhua Yao Weurui (Chemical Engineering Department)

【机构】 华东冶金学院化学工程系华东冶金学院化学工程系

【摘要】 本文用电化学和光电化学方法研究了在硼酸/硼酸钠溶液中铁钝化膜厚度和成膜电位的关系。指出铁钝化膜由两层氧化物组成,内层为具有导电体性质的Fe3O4,外层为具有半导体性质的Fe2O3,在钝化区的电位范围内,内层Fe3O4的厚度和成膜电位无关,而外层Fe2O3的厚度和成膜电位成正比关系。

【Abstract】 The thickness of the passive film on iron formed in pH=8.4 boric acid/borate solution has been measured by the electro-chemical and the photoelectrochemical methods. The dependence of the thickness of the iron passive film on the filmforming potential has been discussed. Resultr indicated that iron passive film consists of an inoer Fe3O4 and an outer Fe2O3 layer at the passive potential region, the thickness of inner Fe3O4 layer is not affected by the film-forming potential φ and the thickness of outer Fe2O3 layer is proportional to the film-forming potential φ.

  • 【文献出处】 华东冶金学院学报 ,Journal of Anhui University of Technology(Natural Science) , 编辑部邮箱 ,1990年04期
  • 【被引频次】5
  • 【下载频次】239
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