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Ge衬底上的Ⅱ-Ⅵ族化合物MBE生长研究

A Study on Ⅱ-Ⅵ Compounds Grown on Ge Substrates by Molecular Beam Epitaxy

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【作者】 钟建国; 谢钦熙; 张恕明; 乔怡敏; 袁诗鑫;

【Author】 Zhong Jianguo/Shanghai Institute of Technical Physics, Academia SinicaXie Qinxi/Shanghai Institute of Technical Physics, Academia SinicaZhang Shuming/Shanghai Institute of Technical Physics, Academia SinicaQiao Yimin/Shanghai Institute of Technical Physics, Academia SinicaYuan Shixin/Shanghai Institute of Technical Physics, Academia Sinica

【机构】 中国科学院上海技术物理研究所; 中国科学院上海技术物理研究所;

【摘要】 本文报道了单晶ZnSe、ZnTe和CdTe薄膜在Ge(100)衬底上的MBE生长,用RHEED观察了其生长规律,并对样品作了X光衍射及SIMS等测试分析。观察到衬底与外延层之间存在晶向偏角。对这一现象进行了理论解释。

【Abstract】 Single crystal ZnTe, ZnSe and CdTe films were grown on (100) Ge substrates by molecularbeam epitaxy (MBE). The growth processes were observed and analyzed in situ by reflectionhigh-energy electron diffraction (RHEED). The epitaxial layers and interfaces were evaluatedby X-ray diffraction and SIMS measurements, espectively.It has been observed that thereis misorientation between the epitaxial layer and its substrate, which can be explained in a theoreticalmodel.

  • 【文献出处】 半导体学报 ,Chinese Journal of Semiconductors , 编辑部邮箱 ,1990年09期
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