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光热偏转光谱技术检测光学薄膜的吸收率及其定标
A Measurement and Calibration of Absorbance in Optical Thin Film by Photothermal Deflection Spectroscopy
【摘要】 本文简要叙述了光热偏转光谱技术检测薄膜吸收率的基本原理和定标方法,测量了一系列光学薄膜样品的微弱吸收率。以35mW的氦-氖激光器作为泵浦光源,0.5mW的氦—氖激光器作为测光,以碳黑膜作为标准样品定标得到1×10-6的灵敏度。
【Abstract】 The fundamental and calibrated method for mesuring absorbance in optical thin film have been studied and weak absorbance in optical thin films have b-een measured in this paper.The sensitivity of 10-6 magnitude has been demonstrated by the experiments with 35 mW He-Ne laser as a pump beam, 1 mW He-Ne laser as a probe beam and a carbon black thin film as a calibrator.
【关键词】 光热偏转光谱;
吸收率测量;
光学薄膜;
定标;
【Key words】 Photothermal deflection spectroscopy; Optical thin film; Absorb-ance measurement; Calibration.;
【Key words】 Photothermal deflection spectroscopy; Optical thin film; Absorb-ance measurement; Calibration.;
【基金】 国家自然科学基金
- 【文献出处】 浙江大学学报(自然科学版) ,Journal of Zhejiang University(Natural Science) , 编辑部邮箱 ,1989年04期
- 【被引频次】2
- 【下载频次】123