【摘要】 作者建立了一套激光反射法薄膜应力测量装置。经分析得到其测量相对误差小于10％,灵敏度为1.8×10⁸dyn/cm²。利用该装置测量了常用的PECVD SiN和SiO₂钝化膜的应力,它们均呈压应力,数值分别为1～3×10¹⁰dyn/cm²和1～2×10⁹dyn/cm²。给出了不同的工艺条件、薄膜厚度和测试温度下的应力以及退火处理对应力的影响。更多还原

【Abstract】 A laser reflection apparatus for measurement of stresses in thin films has been made. Calculation results showed that the relative measuring error was less than 10% and the sensitivity was 1.8 × 108dyn/cm2. Stresses in commonly used PECYD SiN and SiO₂ Passivated films were measured using this appatatus and thcy exhibited compressive stress of 1³+10dyn\cm² and 1-2+10³ dyn\cm² respectively the effect of deposition comditions film thicknesses measting tempcrature and annealing process are presseted更多还原