【摘要】 本文主要论述磁控溅射离子镀技术是金属材料表面合金化的一种新方法。电子探针分析表明,金属基体磁控溅射离子镀金属膜是靶材元素和基材元素组成的混合膜。X 射线衍射分析证明,磁控溅射离子镀膜不单纯是靶材元素组成的膜,而是含有靶材元素和基体元素相互作用而形成的化合物相的合金膜;在一定的实验条件下,腹的相组成主要是由靶(阴极)材料、基板材料和基板负偏压所决定的。更多还原

【Abstract】 The present paper focuses on the point that the magnetron sputtering ion plating process is anew technique for surface alloying of metallic materials.The results of EPMA showed that the metallicfllms deposited on the metallic substates by the magnetron sputtering ion plating process are the mixed filmswhich consist of the elements of the target and the substrate.X-ray diffraction analysis proved that the ma-gnetron sputtering ion plating films are not purely made up of the elements of the target.The films are alloyfilms containing the compound phases which are formed under the interaction of the elements of target ma-terials and substrates.On given experimental conditions,the phases of the films are mainly dependent on thecathode material,the substrate material and the negative bias of the substrate.更多还原