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利用离子注入硅及Nd:YAG连续激光退火制备厘米波段雪崩管

Fabrication of Centimeter Wave Impatt Diode Using Implanted Silicon and CW Nd: YAG Laser Annealing

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【作者】 朱美芳姚德成刘世祥石万全杨丽华

【Author】 Zhu Meifang/Graduate School, University of Science & Technology of ChinaYao Decheng/Graduate School, University of Science & Technology of ChinaLiu Shixing/Graduate School, University of Science & Technology of ChinaShi Wanquan/Graduate School, University of Science & Technology of ChinaYang Lihua Institute of Semiconductors,Ministry of Post & Telecommunication)

【机构】 中国科技大学研究生院邮电部半导体研究所

【摘要】 采用离子注入硅及Nd:YAG连续激光退火制备厘米波P~+nn~+结构雪崩二极管.器件输出功率达1.25W,效率达7.7%.与热退火工艺结果进行比较.讨论了将连续激光退火用于制备毫米波雪崩管的有利方面.

【Abstract】 Centimeter wave IMPATT diode with p~+nn~+ structure has been manufactured byusing Nd:YAG CW laser to anneal B~+ implanted Silicon. The diode’s output poweris 1.25 W and it’s effeciency reaches 7.7%. Comparison is made between the resultsof the laser annealing and those of the thermal annealing. The application of CWlaser annealing in making millimeter wave IMPATT diode is discussed.

  • 【文献出处】 半导体学报 ,Chinese Journal of Semiconductors , 编辑部邮箱 ,1983年02期
  • 【被引频次】1
  • 【下载频次】19
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