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三价铬电沉积铬基二元合金工艺的研究进展

Review of Chromium Binary Alloy Electrodeposition Technologies from Trivalent Chromium Baths

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【作者】 屠振密胡会利侯峰岩

【Author】 TU Zhen-mi1,HU Hui-li1,HOU Feng-yan2(1.Applied Chemistry Department of Harbin Institute of Technology at Weihai,Weihai 264209,China; 2.Surface Technology Research Institute of Shanghai Baosteel Equipment Maintenance Co.,Ltd., Shanghai 201900,China)

【机构】 哈尔滨工业大学(威海)应用化学系上海宝钢设备检修有限公司表面技术研究所

【摘要】 近年来,由于六价铬的毒性及其对环境的严重危害,加快了三价铬电沉积的研究。但三价铬电沉积难以获得厚铬镀层,而铬基二元合金在镀厚性方面具有明显的优势。详细总结了三价铬体系电沉积铬镍、铬铁、铬钴、铬磷、铬碳和锌铬等二元合金的工艺,并简述了镀层的特性及应用。三价铬合金电镀将会在生产中有着广阔的应用前景。

【Abstract】 Since hexavalent chromium has bad effects on environment,research on the trivalent chromium electrodeposition has been accelerated.Thick chromium coatings are difficultly deposited from trivalent chromium bath,and chromium binaryalloy coatings have distinct advantages at deposit thickness.Electrodeposition technologies of Cr-Ni,Cr-Fe,Cr-Co,Cr-P,Cr-C and Zn-Cr from trivalent chromium bath were summerized.The binaryalloy coatings characteristics and application were briefly introduced also.Chromium binary alloy electrodeposited from trivalent bath promisingly will have a wide application prospect in industry.

【基金】 中央高校基本科研业务费专项资金(HIT.NSRIF.2009154)
  • 【文献出处】 表面技术 ,Surface Technology , 编辑部邮箱 ,2012年06期
  • 【分类号】TQ153.2
  • 【被引频次】8
  • 【下载频次】226
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