【作者】 高立国；

【导师】 吕男； 迟力峰；

【作者基本信息】 吉林大学 ， 物理化学， 2011， 博士

【摘要】 纳米加工作为纳米科技中的一个重要的组成部分,近年来备受人们的关注。纳米压印技术是纳米加工中的一种非常重要方法,具有效率高、面积大、重复性强、分辨率高等优点,自发明以来备受人们的青睐。但是纳米压印过程中使用的模板制备成本较高,尤其是高分辨率和复杂结构的模板制作成本更高。本论文通过控制纳米压印过程中产生的缺陷,构筑了比模板结构分辨率高的聚合物结构以及开口环状的复杂聚合物结构,进一步降低纳米压印技术的成本,探索这两种结构的应用,并研究了传统的纳米压印技术在制备聚合物双色发光图案中的应用。首先,我们详细的研究纳米压印的全过程,通过调整阻挡层聚合物厚度与压印模板腔体之间的关系,对聚合物薄膜不足以填充模板沟槽的压印过程进行了深入的研究,并尝试改变聚合物薄膜厚度等条件,实现了用微米级模板制备亚微米或纳米级模板。第二,基于对缺陷纳米压印技术的研究,发明了倾斜纳米压印,并结合纳米转移印刷技术,将金属开口环形结构转移到玻璃等平面或曲面基底,制备出具有负折射系数性质的纳米开路电流环谐振器。通过调整模板结构尺寸的大小,制备了结构大小只有240 nm的纳米开路电流环谐振器。此外,利用这种方法还制备了与开口环形互补的、被称之为“热点”的新月形纳米金属孔洞结构。第三,我们分析了有机染料ANP分子在聚合物PMMA中的扩散行为,通过优化聚合物的厚度、染料分子的量等条件,实现了聚合物薄膜的厚度对染料分子聚集形态的调制,从而调控染料分子的发光颜色。用一种染料分子结合一步纳米压印的方法,实现了双色发光图案的制备。更多还原

【Abstract】 Nanofabrication has recently attracted much attention because it plays an important role in nanotechnology. The improvement of microelectronic devices and information technologies depends on the development of nanofabrication. Usually, methods used in nanofabrication are characterized as "conventional nanofabrication" and "nonconventional nanofabrication" techniques. The "conventional nanofabrication" techniques include photo lithography, electron beam lithography, focused ion beam etching, etc.; the "nonconventional nanofabrication" techniques inculde molding, embossing, printing, etc.Nanoimprint lithography (NIL) is one of the most important nonconventional lithographic techniques for fabricating nanometer scale pattern. It has been widely used in photonics, biotechnology, electronics, optoelectronics and other related areas due to its advantages such as high efficiency, large area, reproducible, and high resolution. Since it was first invented by Prof. Stephen Chou in 1995, NIL has made great progress. With the development of NIL, many new types of NIL have emerged, such as roller nanoimprint lithography, soft lithography, edge lithography, nanotranfer printing, and reversal nanoimprint technique, which accelerate the industrialization of NIL. However, the cost of high-resolution molds and complex structure patterned molds for NIL is still very high, which seriously limits the development of NIL.In this thesis, we aimed on fabricating the polymer pattern with higher resolution and complex split-ring structure by controlling the defects during nano imprint process and studying the applications of these structures. It can reduce the cost of NIL by transferring the polymer patterns onto Si substrate. Moreover, we try to fabricate bicolour pattern based on traditional NIL.Firstly, the whole nanoimprint process was studied in detail. The critical process of nanoimprint is how the polymer fills the cavity in the molds. The basic theoretical issue is mainly about the filling behavior of polymer rheological properties. The formation of incompletely replicated structures is because the polymer cannot fully fill the spaces between the mold and the substrate. By adjusting the thickness of polymer film, the high-resolution polymer pattern is fabricated using the inexpensive mold with large cavity. We further transfer this pattern onto Si substrate by RIE, and the high-resolution mold was fabricated finally.Secondly, we present a new method to fabricate split-ring structure on polymer surface by controlling the defects of NIL, we called it tilted nanoimprint lithography. These complex structures can be transferred onto glass substrate and form split-ring resonators (SRRs) by using nanotranfer printing. The feature size of SRRs can be further scaled down to 240 nm by scaling down the nanopillars of the original imprinting mold and optimizing the thickness of polymer film. The nature of the elastic molds makes this strategy suitable for creating structures on curved surface. In addition, crescent-shaped nanohole metallic structures, called "hot spots", are also prepared by using this method, which can be used in surface-enhanced Raman spectroscopy, surface-enhanced fluorescence, plasmon resonance energy transfer, etc. This method combines the advantages of NIL and nanotransfer printing. It is a fast, easy-to-implement, and low cost method to fabricate SRRs with high throughput.Thirdly, we study the diffusion behaviour of dye molecules on PMMA film. The state of dye species can be adjusted by controlling the thickness of polymer film. Hence, we can modulate the different color of dye species on the polymer film with different thickness. Finally, the bicolor pattern can be fabricated with a single dye species on the nanoimprinted surface due to the formation of monomers and aggregates at protrusion and recess areas respectively. It is a low cost and high efficiency method to fabricate multicolor pattern over large area, which has potential applications in the field of full color display.更多还原