节点文献
UV-LIGA-微细电火花加工组合制造技术基础研究
Fundamental Research on UV-LIGA-Micro-EDM Technology
【作者】 明平美;
【导师】 朱荻;
【作者基本信息】 南京航空航天大学 , 机械制造及其自动化, 2006, 博士
【摘要】 MEMS (Micro Electromechanical System)技术作为新兴技术,受到学术界、产业界和政府部门的极大重视,已经在信息、精密机械、汽车、航空航天、生物医药和国防等领域得到较广泛应用。微细加工是MEMS和Micro/Meso尺度结构器件的实现基础和技术关键。以具有优越热力学、光学和化学性能的SU-8系列光刻胶为光敏材料、紫外光为曝光光源的UV-LIGA技术,是借用LIGA(德语:LIthograpie,Galvanoformung,Abformung三词缩写,由X射线光刻、电铸成型和塑铸成型等三个主要工艺步骤组成)工艺思路,且制造成本低廉、工艺可控性好、易于实现批量生产、胶模制作质量高的新型高深宽比三维Micro/Meso结构技术,是近年微细加工领域的研究热点。微细电火花加工作为一种低成本、高材料选择度的柔性非接触式加工技术,在微制造中具有独特的工艺优势,尤其在加工Micro/Meso尺度金属结构器件方面表现突出。整合UV-LIGA和MicroEDM各自工艺优点而形成UV-LIGA-MicroEDM组合加工技术以制造形状复杂、材料性能优越或特殊的Micro/Meso尺度结构器件,是微细加工的创新性思路。本文在国家自然科学基金(50375073)和两项江苏省自然科学基金(BK2002206、BK2004214)的资助下,围绕UV-LIGA及其与微细电火花加工技术组合以制造Micro/Meso尺度金属结构器件的一些技术基础和工艺关键进行了探讨与研究。全文共七章:第一章概述了UV-LIGA及其与微细电火花组合加工的研究现状、技术关键以及本文的研究内容。第二章描述了SU-8胶光刻各操作环节的工艺基础和技术难点,以金属基片上制备厚度100~200μm胶模为对象,试验研究并优化了前烘、曝光、后烘等工艺环节的操作条件及工艺参数。相比硅基片SU-8胶光刻工艺,降低前后烘程度和适度提高曝光剂量,并辅助超声振动去除胶中气体、静置、随炉冷却等措施,能大大改善胶模质量。试验研究并分析了超声功率对不同特征类型(阳型和阴型)胶模结构显影质量的影响并优选了各自适宜的功率大小,阳型结构实施的超声功率要比阴型结构要低一定值。分析了不同金属片(不锈钢和铜)不同特征类型(阳型和阴型)胶模去胶的工艺特点,并开展了相应试验研究,用NMP去胶液作为去胶试剂,辅助加热、溶液超声振动搅拌、热胀冷缩等措施,获得较为理想的去胶效果。在此基础上,制备出了轮廓清晰,表面质量好,无明显缺陷,与基底粘结性强的平面微线圈、微型流道、微型柔性探针和筛网等胶模。第三章在分析电沉积时电极过程液相传质方式及其作用规律的基础上,探讨了微细电铸时物质输运受限的影响因素,建立了微深槽类特征电沉积时液相传质的两种数值分析模型(一维模型和二维模型),分别描述多种物质组分的扩散、电离、电迁移和电沉积的动力学过程和单一物质组分在强制对流、自然对流和扩散等综合作用下的物质传输情
【Abstract】 MEMS(Micro Electromechanical System) technology has been paid the most attention to by academe,industrial field and governments.It has been applied in many fields such as information,precision machine,automobile,aeronautics and astronautics,biology and medicine and national defence. MEMS and micro/meso-structures & -devices are produced by microfabrication technology and their key to realization is also the microfabrication technique. UV-LIGA, which takes SU-8 resist as photosensitive material and ultraviolet light as exposure energy and adopts LIGA’s process concept , is a new high-aspect-ratio 3D-microstructure technique. It has many advantages over other microfabriction technology including:low machine cost,high resist mould fabrication quality,easy to control and convenient for producing batchedly.UV-LIGA has been a research hotspot in the microfabrication field in these years. SU-8 resist has outstanding mechanical,optical and chemical performance. LIGA(LIthograpie,Galvanoformung,Abformung) was first developed in Germany and it includes three main processing steps:X-ray photography,electroforming and moulding. MicroEDM(Micro Electrodischarge Machining),which has low machine cost and large material’s selection range, is a flexible and non-contacting microfabrication method and has many especial process advantages in microfabrication field,especial in fabricating metal micro/meso-structures & -devices with excellent or especial material performance.UV-LIGA-Micro EDM which combines UV-LIGA and MicroEDM is a novel hybrid microfabrication innovation,it adopts their respective processing advantages and is expected to micromachine MEMS and micro/meso-structures & -devices with complex shapes, excellent or especial material performance batchedly.This dissertation was supported by National Natural Science Foundation (50375073)and Jiangsu Province Natural Science Foundation(BK2002206,BK200421413),and it discussed and studied some technology basises and process keys centring on UV-LIGA and its combination with MicroEDM microfabricating micro/meso-structures & -devices.This dissertation consisted of seven chapters,including:The first chapter of this dissertation overviewed the research status and technology keys of UV-LIGA and UV-LIGA-MicroEDM hybrid microfabrication,it also depicted the research tasks of the present dessertation。In the second chapter,the diessertation described process basis and technique keys to all process steps of SU-8 resist photography,and then studied experimentally and optimized process conditions and parameters of some process steps including before-exposure bake,exposure and post-exposure bake in order to fabricate resist moulds in height 100~200μmon metal substrate.Experimental results showed it was helpful to improve resist mould quality if taking the following measures:reducing before- and post-exposure bake degree and increasing exposure energy moderately and interdependently,adding some accessorial steps such as removing gas in resist with ultrasound stirring,placing in air for a few minutes between the steps,cooling resist in the closed stove.It also analysed the influence of ultrasound power of resist development on microstructure quality of positive and negative resist mould,and then picked out respective appropriate ultrasound power.Experimental results indicated that ultrasound power of development of positive resist mould should be
【Key words】 MEMS; UV-LIGA; Micro EDM; Micro fabrication; SU-8; Micro electroforming; Electric erosion resistance; Meso-machining;