Fabrication of nc-Si and ordered nc-Si array is a key for the development and applica-tion of nc-Si in Nano-technology and modern microelectronics industry.We proposed a new method,the combination of KrF excimer pulsed laser and phase shift grating,to crystallize the a-Si∶H(4nm)/a-SiN x ∶H(10nm)multilayers(MLs )and tempted to fabricate three-dimensional ordered Si array.The crystallinity,morphology and microstructure of the laser interference crystallized samples are observed by Raman scattering...