In this paper the circuit for power transmission from the radio-frequency generator to the vacuum chamber of a plasma or reactive ion etching device has been analysed based upon the theory of distributed parameters circuitry. A formula for calculating the parameters of the Ltyped match network has been derived by means of twin-port network analysis. A new approach to automatic matching using nonlinear selfoptimization control strategy has been proposed in accordance with the relationship between the photo-e...
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