【作者】 徐利； 顾豪爽； 王忠太； 陈侃松；

【Author】 XU Li, GU Hao-shuang, WANG Zhong-tai, CHEN Kan-song (The Key Laboratory of Ferro & Piezoelectric Materials and Devices of Hubei Province, Faculty of Physics & Electronic Technology, Hubei University, Wuhan 430062,China)

【机构】 湖北大学压电铁电材料与器件湖北省重点实验室物理学与电子技术学院；

【摘要】 采用PLD方法在双面抛光的石英基片上制备出均匀透明的0．1BiFeO3-0．9SrBi2Nb2O9薄膜,用 XRD方法测得了薄膜的结晶性能。该薄膜呈(115)择优取向;用AFM表征了薄膜的表面形貌,结果表明薄膜结晶度良好,表面比较光滑,其表面方均根粗糙度为 4．506nm(2μm×2μm)。用单光束Z扫描技术测得了该薄膜的三阶非线性光学性质,其三阶非线性极化率的实部ReX(3)=3．78×10-9esu,虚部IeX(3)=1．02×10-9 esu。更多还原

【Abstract】 The 0.1BiFeO3-0. 9SrBi2Nb2O9, thin films were prepared on quartz substrates by the pulsed laser deposition technique. The structure and morphology of the samples were characterized by X-ray diffraction and a tomic force microscopy. The X-ray diffraction showed that the film has a good crystallization and a strongest (115) peak. The root-mean-square surface roughness within 2μm×2μm area were 4. 506nm suggesting excellent smoothness and uniformity of the films. The nonlinear optical properties of the films were determined by a single beam Z-scan. The values of the real and imaginary parts of the third-order nonlinear susceptibility X(3) were measured to be 3. 78 × 10-9esu and 1. 02×10-9esu.更多还原