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条形射频源大口径离子束刻蚀机性能(英文)

Characteristics of a large-scale ion beam etcher based on radio frequency linear source

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【作者】 董晓浩刘颖赵飞云徐德权徐向东周银贵汪啸姚传荣洪义麟付绍军徐朝银

【Author】 DONG Xiao-hao,LI U Ying,ZHAO Fei-yun,XU De-quan,XU Xiang-dong,ZHOU Yin-gui,WANG Xiao,YAO Chuan-rong,HONG Yi-lin,FUShao-jun,XU Chao-yin(National Synchrotron Radiation Laboratory,University of Science and Technology of China,Hefei230029,China)

【机构】 中国科学技术大学国家同步辐射实验室中国科学技术大学国家同步辐射实验室 安徽合肥230029安徽合肥230029

【摘要】 针对大尺寸基底往复扫描条形离子束来实现大面积刻蚀的特点,实验测试了基于射频感应耦合等离子体离子源大型离子束刻蚀机的性能.利用法拉第筒扫描探测系统在线测量束流密度,通过控制气体流量、调节加速电压等,得到了纵向束流密度±5.3%均匀性的较好结果.刻蚀实验表明40 cm长度范围刻蚀深度均匀性为±5.4%,同时具有较好的束流稳定性.添加束阑,并结合掩模修正束流,会得到更好的束流密度与刻蚀深度均匀性.

【Abstract】 The characteristics of a large scale ion beametcher with a radio frequencylinear source were described.With a 6 cm×66 cm rectangular beam which the substrate carriage traverses back and forth,an area as large as 40 cm×40 cmcan be covered.According to theillustration of the operating principle,construction features of the etcher,commissioning results and technical performance were presented.Measurements with a scanning Faraday-cup based on current probe were used to opti mize the ion beamspatial uniformity.A±5.3 %uniformity of current density along the major axis of theion source was achieved.Etching experi ments showa good uniformity of ±5.4 %of etching depth over the 40 cm.The uniformity can bei mproved combined with beam revising by beam diaphragm and correction mask.Through the measurement of beam current stability,performance of the system was also takeninto account.

【基金】 National High Technology Research and Development Program of China(“863”Program)(2005AA849020)
  • 【文献出处】 中国科学技术大学学报 ,Journal of University of Science and Technology of China , 编辑部邮箱 ,2007年Z1期
  • 【分类号】TN305
  • 【下载频次】136
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