【摘要】 采用离子束辅助蒸发,以TiO2,Ti3O5,Ti2O3为膜料,制备了具有良好光学透射性的TiO2薄膜。结果分析表明,所制备出的TiO2薄膜均为非晶态结构,退火后薄膜发生晶化均具有明显的(101)择优取向;晶化的程度和退火温度的高低有关;退火处理之后以TiO2,Ti3O5为膜料制备的薄膜透射率下降,而以Ti2O3为膜料的上升;膜料不同对氧的需求量不同:以TiO2,Ti3O5为膜料制备薄膜所需氧量,远小于以Ti2O3为膜料所需氧量,氧流量过多降低了薄膜的透射性能,且随氧流量的不同,薄膜的透射率曲线均发生偏移,膜料不同偏移度也不同。更多还原

【Abstract】 TiO2 thin films were prepared with TiO2,Ti3O5 and Ti2O3 as coating materials by electron-beam evaporation and deposition,using O+ ion beam as auxiliary means.The transmittances of the thin films were excellent.The deposited films are amorphous,and after anneal the films have some crystals which were obviously(101) oriented.The crystallization is correlated with anneal temperature.After anneal the transmittances with TiO2 and Ti3O5 as coating materials reduced but the transmittances with Ti2O3 coating increased.The results show that the O2-flux needed is different for different coating materials.The O2-flux needed for TiO2 and Ti3O5 is much less than that for Ti2O3,and the redundant O2 or O+ can reduce the transmittance of those films.The offset of transmittances are various with different O2-flux and coating materials.更多还原