【摘要】 用射频反应磁控溅射法,250℃时在石英玻璃片上沉积TiO2-x薄膜,用XRD、SEM、XPS、UV-Vis等对其进行表征.结果表明:未经热处理的薄膜呈锐钛矿型,薄膜表面粗糙,粒径约为30 nm的小晶粒聚集在一起,形成一个个“小层”,层层错叠;经600℃保温2 h热处理的薄膜呈金红石型,晶粒较大,孔隙变大.XPS分析发现:未经热处理的薄膜表面存在着20%的三价钛,有与之相对应的较多的氧空位;经600℃在空气中热处理后,三价钛减少到8%,同时氧空位减少.UV-Vis吸收表明,氧空位的存在有利于TiO2-x的吸收边向可见光波段移动.更多还原

【Abstract】 TiO2-x films were prepared on quartz(SiO2) substrates at 250℃ by reactive radio-frequency(RF) magnetron sputtering,then heated at 600℃ in air for 2 h.The films with and without heat-treatment were characterized by XRD,SEM,XPS and UV-Vis.The films with and without heat-treatment presented rutile and anatase polycrystalline structure,respectively.Rough surfaces were obtained for all the films.For the film without heat-treatment,about 30 nm sub-grains grouped together into agglomeration to form layer-over-layer structure.After heated at 600℃,the gain size became larger,the pores got bigger.According to XPS analyses,there were 20% Ti3+ and more oxygen vacancies in the lattice of the film without heat-treatment,while 8% Ti3+ for the films heated at 600℃.The existence of oxygen vacancies helps the absorption edge extend to visible light according to the comparison in UV-Vis absorption.更多还原