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反应磁控溅射法制备TiO2薄膜
Preparing TiO2 Films by Reactive Magnetron Sputtering
【摘要】 采用反应磁控溅射法在不同条件下制备了TiO2薄膜样品,研究了衬底温度、氧分压、溅射压强等生长条件对薄膜结构特性的影响.得到了反应磁控溅射法制备锐钛矿相TiO2薄膜的最佳沉积条件,并对薄膜的表面形貌进行了测量.
【Abstract】 TiO2 films were deposited by reactive magnetron sputtering at different conditions.The influences of the deposition conditions such as substrate temperature,O2 partial pressure and sputtering pressure on the structural properties of the films were studied.The optional process conditions to prepare Anatase TiO2 film was discussed.
【关键词】 TiO2薄膜;
反应磁控溅射;
沉积条件;
【Key words】 TiO2 film; reactive magnetron sputtering; deposition conditions;
【Key words】 TiO2 film; reactive magnetron sputtering; deposition conditions;
【基金】 绍兴市科技局基金项目(20031412004147)
- 【文献出处】 绍兴文理学院学报(自然科学版) ,Journal of Shaoxing University(Natural Science) , 编辑部邮箱 ,2007年02期
- 【分类号】O484.1
- 【被引频次】1
- 【下载频次】169