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高压SOI LDMOS设计新技术——电场调制及电荷对局域场的屏蔽效应在高压SOI LDMOS设计中的应用
New Technology for High-Voltage SOI LDMOS——Application of electric field modulation and charge shielding effects to high-voltage SOI LDMOS
【摘要】 针对SOI基LDMOS结构的特殊性,结合高压器件中击穿电压和比导通电阻的矛盾关系,以作者设计的几种新型横向高压器件为例,说明了利用电场调制和电荷对局域场的屏蔽效应来优化设计新型SOI LDMOS的新技术;同时,指出了这种新技术较传统设计方法的优缺点。
【Abstract】 In view of the particularity of SOI LDMOS,a new technology was developed,in which effects of the electric field modulation and charge shielding were utilized to design new types of SOI LDMOS.A number of typical lateral high-voltage devices were designed to further improve trade-off characteristics between breakdown voltage and specific on-resistance.Finally,advantages and disadvantages of this new technology are discussed,compared with the conventional methods.
【关键词】 SOILDMOS;
击穿电压;
比导通电阻;
电场调制;
屏蔽效应;
【Key words】 SOI LDMOS; Breakdown voltage; Specific on-resistance; Electric field modulation; Shielding effect;
【Key words】 SOI LDMOS; Breakdown voltage; Specific on-resistance; Electric field modulation; Shielding effect;
【基金】 国家自然科学基金重点项目《单片功率系统集成(PSOC)基础理论与技术研究》资助(60436030)
- 【文献出处】 微电子学 ,Microelectronics , 编辑部邮箱 ,2007年04期
- 【分类号】TN386.1
- 【被引频次】8
- 【下载频次】282