【摘要】 对目前线边缘粗糙度(Line edge roughness,LER)的研究进行了分类,区分线宽变化率、线的边缘粗糙度和侧墙(边缘)粗糙度的物理本质。重新给出一个LER定义,定义LER是由加工工艺和材料本身结构引起的刻线侧墙的表面形貌微观不规则程度,并分析给出定义的合理性。给出该定义和ITRS定义间的换算关系。结合刻线的加工过程主要发生在刻线的边缘表面,且该加工过程发生于深纳米尺度,给出一种基于原子尺度的LER计量模型,在该模型中分离了材料本质粗糙度。更多还原

【Abstract】 The current study status of line edge roughness(LER) is analyzed,which indicates LER itself has already been used to refer to many properties including line width uniformity,roughness of line edge and sidewall roughness.And the differ-ent meaning of LER is explained.A new definition of LER is brought forward,i.e,LER is the microcosmic roughness of the sidewall topography,which is caused by processing and the character of materials measured.At the same time,explain the definition relation with it from ITRS and also analysis this definition rationality.According to the process which is mainly on the edge surface and dimension is in nanometer field,a mathematics model to calculate LER is shown in atomic di-mension.In this model,the roughness from the material intrinsical character is separated.更多还原