节点文献
激光化学气相沉积(连载之三)
Laser Chemical Vapour Deposition(LCVD)(Ⅲ)
【摘要】 本讲座介绍了激光化学气相沉积的基本原理,较详细地讲述了制备金属薄膜、金刚石薄膜、类金刚石薄膜、氢化非晶硅薄膜、化合物半导体薄膜及绝缘体薄膜等所用的激光器、工艺参数以及薄膜的性能。
【Abstract】 The basic principles of laser chemical vapour deposition were introduced.The applied lasers,technological processes and properties of the deposited metal thin films,diamond thin films,diamond-like thin films,hydrogenated amorphous silicon thin films,compound semiconductor thin films and insulating thin films etc.were described in details.
【关键词】 激光化学气相沉积;
激光诱导;
激光辅助;
光解激光;
热解激光;
光热共解激光;
【Key words】 laser chemical vapour deposition(LCVD); laser inducement; laser assisted; photolytic laser; pyrolytic laser; photothermallytic laser;
【Key words】 laser chemical vapour deposition(LCVD); laser inducement; laser assisted; photolytic laser; pyrolytic laser; photothermallytic laser;
- 【文献出处】 金属热处理 ,Heat Treatment of Metals , 编辑部邮箱 ,2007年08期
- 【分类号】TB43
- 【被引频次】1
- 【下载频次】470