【摘要】 介绍了等离子体磁控溅射原理和矩形磁控靶,探讨了几种新型等离子体非平衡磁控溅射技术,其中包括脉冲磁控溅射和离子辅助溅射,重点分析了工艺要点,并就存在的问题提出了解决思路。更多还原

【Abstract】 Principles of magnetron sputtering and rectangular magnetron were introduced.Several up-to-date unbalanced magnetron sputtering techniques in plasma vacuum deposition field,including pulsed magnetron sputtering and plasma assisted sputtering were discussed,and the main process highlights were emphasized.Based on the existing problems,a solution was then provided.更多还原