节点文献
工艺因素对氨基磺酸盐镀铟阴极电流效率的影响
Effect of Parameters on the Cathodic Current Efficency of Indium Electroplating in the Indium Sulfamate Bath
【摘要】 对氨基磺酸盐体系镀铟阴极电流效率的影响因素及其规律进行了系统的研究,通过分析镀液pH值、电流密度、镀液温度、添加剂以及电镀时间与阴极电流效率的关系,确定了镀铟最佳工艺参数。结果表明:当pH值为1.8~2.0,电流密度为1.8~2.2A/dm2,温度为20~30℃,胺类添加剂加入量少于0.2g/L,电沉积1min,可以获得银白色的铟镀层,且阴极电流效率达到80%以上。
【Abstract】 The factors affecting the cathodic current efficiency of indium sulfamate plating are systematically studied.By analyzing the relationship of electrolyte pH,current density,electolyte temperature,additive and plating time to the cathodic current efficiency,obtaining the best process parameter of indium electroplating.The results show that the value of pH is 1.8~2.0,current density is 1.8~2.2A/dm2 and the electolyte temperature is 20~30℃,addition of TEA lower than 0.2g/L,it can obtain excellent indium coating with plating time of 1 minute,and the cathodic current efficiency greater than 80%.
【Key words】 indium sulfamate bath; indium plating; cathodic current efficiency;
- 【文献出处】 金属功能材料 ,Metallic Functional Materials , 编辑部邮箱 ,2007年04期
- 【分类号】TQ153.19
- 【被引频次】6
- 【下载频次】234