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γ′-Fe4N薄膜的制备及其磁性
Preparation and Magnetic Properties of γ′-Fe4N Thin Films
【摘要】 采用直流磁控溅射方法,以Ar/N2为放电气体(N2/(Ar+N2)=10%),在玻璃和NaCl(100)单晶片上分别沉积获得Fe-N薄膜样品.利用X射线衍射(XRD)、原子力显微镜(AFM)和超导量子干涉仪(SQUID)对样品的结构、形貌和磁性能进行分析,研究基片和基片温度等条件对薄膜的影响.结果表明,以NaCl单晶为基片获得单相γ′-Fe4N薄膜,与玻璃基片相比可降低其生成的基片温度并可扩大形成温度的范围,且比饱和磁化强度略有增大.
【Abstract】 The Fe-N thin films were deposited on single crystal NaCl(100) and glass substrates via DC magnetron sputtering with an Ar/N2 gas mixture(N2/(Ar+N2)=10%) as the discharging gas.The structure, morphology and magnetic properties of the films were characterized by means of X-ray diffraction(XRD),Atomic force microscope(AFM) and superconducting quantum interference device(SQUID).The effects of substrate and substrate temperature on the structures and magnetic properties of the thin films were investigated.It was shown that the substrate temperature of single phase γ′-Fe4N deposited on NaCl(100) substrate was lower than that on glass substrate.The formation temperature scope and magnetization of single phase γ′Fe4N on NaCl(100) substrate are all increased.
- 【文献出处】 吉林大学学报(理学版) ,Journal of Jilin University(Science Edition) , 编辑部邮箱 ,2007年02期
- 【分类号】O484.1
- 【被引频次】3
- 【下载频次】110