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半导体桥(SCB)冲击片起爆技术研究
Initiation Technique of Semiconductor Bridge(SCB) Slapper
【摘要】 优化设计了硅半导体芯片及桥区参数,并对SCB冲击片起爆HNS-Ⅳ炸药及影响发火能量的因素进行了试验研究。结果表明,致密性好的SCB多晶硅,厚度为4μm时,50%发火能量低,起爆重现性好。
【Abstract】 Parameters of silicon semiconductor chip and bridge section were designed and optimized.The initiation of HNS-Ⅳexplosive with SCB lapper was carried out and the factors influencing firing energy were studied.Results show that when thickness of SCB slapper with good compactness of polycrystalline silicon is 4 μm,the 50% firing energy is low,and initiation compactness is good.
【关键词】 应用化学;
起爆;
半导体桥冲击片;
发火能量;
半导体芯片;
【Key words】 applied chemistry; initiation; semiconductor slapper; firing energy; semiconductor chip;
【Key words】 applied chemistry; initiation; semiconductor slapper; firing energy; semiconductor chip;
- 【文献出处】 含能材料 ,Chinese Journal of Energetic Materials , 编辑部邮箱 ,2007年02期
- 【分类号】TJ453
- 【被引频次】10
- 【下载频次】271