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Si基片上的镧钙锰氧巨磁阻薄膜材料的微结构分析
The Analysis on Microtrucure in Perovskoyes Colossal Magnetoresistance Thin Films on the Si(100) Wafer
【摘要】 采用溶胶-凝胶法在Si单晶上制备了定向生长的巨磁阻锰氧化物La0.8Ca0.2MnO3(LCMO)薄膜样品,并用X射线衍射(XRD)、偏光显微镜及原子力显微镜(AFM)对薄膜样品的微结构进行了分析。实验发现在某些特定的条件下LCMO薄膜形成网格结构的现象,并尝试根据分形理论用计算机程序对这种网格现象进行了形貌模拟。
【Abstract】 Using Sol-Gel method,the epitaxial perovskite La0.8Ca0.2MnO3(x=0.2) thin film was prepared on the Si(100)wafer.The X-ray Diffraction(XRD),Polari-microscope,and Atomic Force Microscope(AFM) were used to analyze the microstructure and the figure of the film.It was found that the percolation structure would form under certain condition.The thin film figure and made some interpretations were simulated by fractal method.
【基金】 江苏省自然科学基金BK2004078资助
- 【文献出处】 化工时刊 ,Chemical Industry Times , 编辑部邮箱 ,2007年04期
- 【分类号】TB383.2
- 【被引频次】3
- 【下载频次】173