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掺Cu的SrBi2Ta2O9薄膜的非线性光学特性的研究
Properties of the optical nonlinearity in Cu:SrBi2Ta2O9 thin films
【摘要】 以SrBi2Ta2O9陶瓷和高纯Cu片作为靶材,利用射频磁控溅射方法在双面抛光的石英基片上制备了掺Cu金属颗粒的SrBi2Ta2O9复合薄膜.用XRD和AFM表征了薄膜的结晶性能和表面形貌;利用单光束Z扫描技术在波长532 nm处测量了薄膜的非线性光学特性,其三阶非线性光学极化率的实部Reχ(3)=2.26×10-9esu,虚部Imχ(3)=0.62×10-9esu.
【Abstract】 Cu-doped SrBi2Ta2O9 thin films were grown on SiO2 substrates by RF magnetron sputtering method using a SrBi2Ta2O9 target and Cu plates.The structural properties of the samples were characterized by X-ray diffraction and atomic force microscopy.The nonlinear optical properties of the films were determined by a single beam Z-scan at a wavelength of 532 nm.The results show that Cu:SrBi2Ta2O9 thin films exhibit a great nonlinear optical response with the real and imaginary parts of the third-order nonlinear optical susceptibility χ(3) being 2.26×10-9esu and 0.62×10-9esu,respectively.
【Key words】 Cu:SrBi2Ta2O9; thin films; magnetron sputtering; Z-scan; optical nonlinearity;
- 【文献出处】 湖北大学学报(自然科学版) ,Journal of Hubei University(Natural Science) , 编辑部邮箱 ,2007年02期
- 【分类号】O484.41
- 【被引频次】2
- 【下载频次】73