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p型氮化镓退火及发光二极管研究

Investigation of p-GaN Thermal Annealing and Light Emitting Diode

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【作者】 邢艳辉韩军刘建平牛南辉邓军沈光地

【Author】 XING Yanhui HAN Jun LIU Jianping NIU Nanhui DENG Jun SHEN Guangdi(College of Electronic Information and Control Engineering,Beijing Universityof Technology,Beijing,100022,CHN)

【机构】 北京工业大学电子信息与控制工程学院北京工业大学电子信息与控制工程学院 北京100022北京

【摘要】 对金属有机物化学气相淀积(MOCVD)技术在蓝宝石衬底上生长的p型氮化镓(p-GaN)在氮气气氛下的热退火进行研究。用Hall测试系统测量不同温度、不同时间退火后样品的电学性能;对一组蓝光LEDs分别进行不同退火温度、退火时间实验,对退火前后量子阱峰值强度半高宽和积分面积变化进行了比较研究。实验表明p-GaN在825°C、8min条件下退火可以取得较高的空穴浓度,而LED在750°C、30min退火可以使量子阱的半高宽展宽较小,积分强度降低百分比小,而且LED芯片正向电压也较小。

【Abstract】 The p-GaN investigated was grown on sapphire substrates by metal-organic chemical vapor deposition,and thermal annealing under N2ambient.On the different thermal temperature and time conditions,its electrical properties were demonstrated by Hall measure system,and a series of blue LEDs were studied by PL also,then,their full width at half maximum(FWHM) broaden and integral area reduction percentage of LEDs quantum well were compared.It was demonstrated the p-GaN has higher hole carrier concentration under the 825°C/8 minutes condition,and LEDs FWHM broaden and integral area reduction percentage were less under the 750°C/30 minutes condition,and LEDs positive voltage were lower.

【关键词】 氮化物p-氮化镓电学特性发光二极管
【Key words】 nitridesp-GaNelectrical propertiesLED
【基金】 北京市自然科学基金(批准号:D0404003040221);国家863高技术研究发展计划(批准号:2004AA311030)
  • 【文献出处】 固体电子学研究与进展 ,Research & Progress of SSE Solid State Electronics , 编辑部邮箱 ,2007年02期
  • 【分类号】TN312.8
  • 【被引频次】4
  • 【下载频次】374
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