【摘要】 用磁控溅射的方法在40Cr钢的表面制得了SiC薄膜。通过X射线衍射、傅里叶红外光谱分析、摩擦磨损以及划痕试验研究了工艺参数、溅射方式对薄膜性能的影响。结果表明:室温下,用磁控溅射法制备的SiC薄膜具有非晶态结构;傅立叶红外光谱证实了薄膜中除了Si—C键的存在外还有大量的Si—Si键;在相同的工艺参数下用射频溅射法制备的薄膜表面更为光滑致密,与基体结合更好;采用射频溅射法,在功率200W,时间为2h,工作气压为0.1Pa条件下制备的SiC薄膜性能最佳。更多还原

【Abstract】 SiC films on 40Cr steel were gained by magnetron sputtering method.Influence of different process parameters,sputtering methods on the properties of the films was studied with X-ray diffraction test,FT-IR spectroscopic analysis,friction and wear test and scratching test.The results showed that SiC films prepared by RF magnetron sputtering at room temperature are amorphous.FT-IR spectroscopic analysis proves that there are Si—C bond and more Si—Si bond in the film.The films prepared by RF magnetron sputtering are smoother,dense and have better adherence than those prepared by DC magnetron sputtering under the same parameters.Furthermore,the films prepared by RF magnetron sputtering under the power of 200W,the time of 2h and the pressure of 0.1Pa have the best properties.更多还原