节点文献
无氰化学镀金技术的发展及展望
Development and Prospect of Non-cyanide Electroless Gold Plating
【摘要】 综述了化学镀金的研究进展。详细阐述以亚硫酸钠及硫代硫酸钠为配位剂的无氰化学镀金的研究及发展现状。同时介绍了用于印刷线路板(PCB)的置换镀金工艺现状及前景,以期对无氰化学镀金的研究现状及未来发展有更好的了解。
【Abstract】 The progress in research on non-cyanide electroless gold plating is reviewed. The research and status of non-cyanide electroless gold plating using sodium sulfite and/or hyposulphite as complexing agent are described in detail.The status and prospect of immersion gold plating in PCB are presented as well.The purpose is for a better understanding of the present level and future development of non-cyanide electroless gold plating.
【关键词】 无氰;
化学镀金;
配位剂;
亚硫酸钠;
【Key words】 non-cyanide bath; electroless gold plating; complexing agent; sodium sulfite;
【Key words】 non-cyanide bath; electroless gold plating; complexing agent; sodium sulfite;
- 【文献出处】 电镀与环保 ,Electroplating & Pollution Control , 编辑部邮箱 ,2007年03期
- 【分类号】TQ153.1
- 【被引频次】31
- 【下载频次】1051