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氮离子轰击改善胶体石墨薄膜平面场发射特性的研究
Improving the Field Emission Properties of a Graphite Paste Film by Nitrogen Ion Bombardment
【摘要】 研究了氮离子(N+)轰击对石墨薄膜场发射特性的影响。片层石墨被N+轰击成较整齐排列的锥尖阵列,尖端密度~108cm-2。XPS谱证实有许多N原子注入薄膜,膜内存在大量sp2杂化轨道键。场发射测试表明,经过N+轰击,整个薄膜在场发射的均匀一致性方面有较明显的改善,场发射电流密度从0.3增大到1.65 mA/cm2。
【Abstract】 The field emission properties of a graphite paste film were found to have been greatly improved by nitrogen ion bombardment.The bombardment transformed the graphite surface into an array of graphite cones with a ~10~8?cm~-2 tip density.XPS measurement showed that plenty of nitrogen had been injected into the graphite film and there existed a large number of sp~2 bonds.Field emission test demonstrated that the distribution of the emission sites in the post-bombardment film was much more dense and uniform than that of the original one.The maximum current density of 1.65?mA/cm~2 was also achieved,which was much higher than that of the pre-treatment sample.
- 【文献出处】 北京大学学报(自然科学版) ,Acta Scientiarum Naturalium Universitatis Pekinensis , 编辑部邮箱 ,2007年03期
- 【分类号】TM242
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